A Monte Carlo study of backscattering effects in the photoelectron emission from {CsI} into {CH}$less$sub$greater$4$less$/sub$greater$and Ar-{CH}$less$sub$greater$4$less$/sub$greater$mixtures
Távora, L.M.
Journal of Instrumentation Vol. 2, Nº 08, pp. P08001 - -P08001, August, 2007.
ISSN (print):
ISSN (online): 1748-0221
Scimago Journal Ranking: 0,22 (in 2007)
Digital Object Identifier: 10.1088/1748-0221/2/08/p08001
Abstract
Monte Carlo simulation is used to investigate photoelectron backscattering effects in the emission from a CsI photocathode into CH4 and Ar-CH4 mixtures for incident monochromatic photons with energies Eph in the range 6.8 eV to 9.8 eV (182 nm to 127 nm), and photons from a continuous VUV Hg(Ar) lamp with a spectral distribution peaked at Eph = 6.7 eV (185 nm), considering reduced applied electric fields E/N in the 0.1 Td to 40 Td range. The addition of CH4 to a noble gas efficiently increases electron transmission and drift velocity, due to vibrational excitation of the molecules at low electron energies. Results are presented for the photoelectron transmission efficiencies f, where f is the fraction of the number of photoelectrons emitted from CsI which are transmitted through the gas as compared to vacuum. The dependence of f on Eph, E/N, and mixture composition is analyzed and explained in terms of electron scattering in the different gas media, and results are compared with available measurements. Electron drift parameters are also calculated and compared with experimental data, confirming the choice of electron scattering cross-sections used in the simulations.