Comparative study of the electrical properties of diamond films grown by microwave plasma assisted and hot-filament chemical vapour deposition
Mendes, J. C.
; Cabral, G.C.
; Pereira, L.P.
; Ali, N.A.
Thin Solid Films Vol. 515, Nº 1, pp. 106 - 112, September, 2006.
ISSN (print): 0040-6090
Journal Impact Factor: 1,884 (in 2008)
Digital Object Identifier: 10.1016/j.tsf.2005.12.049
Schottky diodes were built on different polycrystalline diamond films grown by Microwave Plasma and Hot Filament Chemical Vapor Deposition and their electrical properties were studied. The barrier height increased with the diamond film quality and the corresponding ideality factor decreased. Even though the lower-quality HFCVD film displayed poor rectifying properties, it was found to be much less sensitive to variations in the operating conditions (air vs. vacuum). The activation energies of the films depend on morphological parameters, as preferable grain size or orientation. The bulk conduction also depends on the quality of the deposited films, changing from ohmic to trap-free or shallow trap SCLC and SCLC with an exponential distribution of traps. The hypothesis of using the electrical measurements as an indicator for film quality has been discussed.