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Diamond growth by chemical vapor deposition

Gracio, J.G. ; Fan, Q.H.F. ; Mendes, J. C.

Journal of Physics D: Applied Physics Vol. 43, Nº 37, pp. 374017-2 - 374017-22, September, 2010.

ISSN (print): 0022-3727
ISSN (online):

Journal Impact Factor: (in 0)

Digital Object Identifier: 10.1088/0022-3727/43/37/374017

Abstract
This paper reviews the growth of diamond by chemical vapour deposition (CVD). It includes the following seven parts: (1) Properties of diamond: this part briefly introduces the unique properties of diamond and their origin and lists some of the most common diamond applications. (2) Growth of diamond by CVD: this part reviews the history and the methods of growing CVD diamond. (3) Mechanisms of CVD diamond growth: this part discusses the current understanding on the growth of metastable diamond from the vapour phase. (4) Characterization of CVD diamond: we discuss the two most common techniques, Raman and XRD, which have been intensively employed for characterizing CVD diamond. (5) CVD diamond growth characteristics: this part demonstrates the characteristics of diamond nucleation and growth on various types of substrate materials. (6) Nanocrystalline diamond: in this section, we present an introduction to the growth mechanisms of nanocrystalline diamond and discuss their Raman features.

This paper provides necessary information for those who are starting to work in the field of CVD diamond, as well as for those who need a relatively complete picture of the growth of CVD diamond.